Technical Interface Overview

The BaffleCraft interface is organized into logical modules, allowing for a seamless transition from global dimensions to refined structural details. Each parameter is mathematically linked to ensure geometric integrity while maintaining maximum artistic freedom.

1. GEOMETRY: Global Footprint

• Rib Count: Determines the total number of lamellas, controlling the rhythmic density of the installation.

• Length / Width: Defines the overall X and Y boundaries of the ceiling system.

2. DETAILS: Lamella Morphology

• Rib Width: Sets the physical thickness of each individual baffle.

• Rib Depth: Establishes the base vertical dimension (height) of the profiles.

• Extension: Controls longitudinal overlap for side-by-side structural joining between segments.

3. GRAPH DESIGN: Parametric Modulation

• C1–C3_Depth: These handles act as the primary drivers for the system's "Graph Mapping." They allow you to define the undulation and profile variance across the ceiling, creating either organic waves or precise architectural gradients.

4. TIE RODS: Structural Components

• Pipe Radius: Controls the thickness of the primary horizontal support members.

• Diagonal Radius: Sets the diameter for the diagonal bracing, essential for realistic structural representation.

• Joint Radius: Adjusts the scale of the spherical connection nodes where rods and pipes intersect.

5. VERSION: System Logic

• Type: A switch that allows you to swap between different construction methodologies (Tie Rods) without losing your base geometric settings.

  
  

  
  

   Mastering the Graph Mapper                                                            

  To shape your ceiling structure, simply adjust the X and Y positions of points within the Graph Mapper to directly redefine the coordinates of the underlying geometry curves. For full 3D spatial control, the system utilizes a dedicated pair of graphs for each of the three primary control curves: one governs the vertical height, while the other manages the positional depth within the ceiling plenum. This dual-graph approach allows you to sculpt complex, three-dimensional undulations with absolute mathematical precision.